ISO-17560-2002.pdf
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1、INTERNATIONAL STANDARD ISO 17560 First edition 2002-07-15 Reference number ISO 17560:2002(E) ISO 2002 Surface chemical analysis Secondary-ion mass spectrometry Method for depth profiling of boron in silicon Analyse chimique des surfaces Spectromtrie de masse des ions secondaires Dosage du bore dans
2、le silicium par profilage dpaisseur Copyright International Organization for Standardization Provided by IHS under license with ISO Licensee=NASA Technical Standards 1/9972545001 Not for Resale, 04/20/2007 04:30:50 MDTNo reproduction or networking permitted without license from IHS -,-,- ISO 17560:2
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6、riat at the address given below. ISO 2002 All rights reserved. Unless otherwise specified, no part of this publication may be reproduced or utilized in any form or by any means, electronic or mechanical, including photocopying and microfilm, without permission in writing from either ISO at the addre
7、ss below or ISOs member body in the country of the requester. ISO copyright office Case postale 56 CH-1211 Geneva 20 Tel. + 41 22 749 01 11 Fax + 41 22 749 09 47 E-mail copyrightiso.ch Web www.iso.ch Printed in Switzerland Copyright International Organization for Standardization Provided by IHS unde
8、r license with ISO Licensee=NASA Technical Standards 1/9972545001 Not for Resale, 04/20/2007 04:30:50 MDTNo reproduction or networking permitted without license from IHS -,-,- ISO 17560:2002(E) ISO 2002 All rights reserved iii Contents Page 1Scope . 1 2Normative reference . 1 3Symbols and abbreviate
9、d terms . 1 4Principle 2 5Reference materials . 2 6Apparatus . 2 7Specimen 3 8Procedures . 3 9Expression of results 6 10Test report 6 Annex AStatistical report of stylus profilometry measurements. 8 Bibliography. 10 Copyright International Organization for Standardization Provided by IHS under licen
10、se with ISO Licensee=NASA Technical Standards 1/9972545001 Not for Resale, 04/20/2007 04:30:50 MDTNo reproduction or networking permitted without license from IHS -,-,- ISO 17560:2002(E) iv ISO 2002 All rights reserved Foreword ISO (the International Organization for Standardization) is a worldwide
11、federation of national standards bodies (ISO member bodies). The work of preparing International Standards is normally carried out through ISO technical committees. Each member body interested in a subject for which a technical committee has been established has the right to be represented on that c
12、ommittee. International organizations, governmental and non-governmental, in liaison with ISO, also take part in the work. ISO collaborates closely with the International Electrotechnical Commission (IEC) on all matters of electrotechnical standardization. International Standards are drafted in acco
13、rdance with the rules given in the ISO/IEC Directives, Part 3. Draft International Standards adopted by the technical committees are circulated to the member bodies for voting. Publication as an International Standard requires approval by at least 75 % of the member bodies casting a vote. Attention
14、is drawn to the possibility that some of the elements of this International Standard may be the subject of patent rights. ISO shall not be held responsible for identifying any or all such patent rights. International Standard ISO 17560 was prepared by Technical Committee ISO/TC 201, Surface chemical
15、 analysis, Subcommittee SC 6, Secondary ion mass spectrometry. Annex A of this International Standard is for information only. Copyright International Organization for Standardization Provided by IHS under license with ISO Licensee=NASA Technical Standards 1/9972545001 Not for Resale, 04/20/2007 04:
16、30:50 MDTNo reproduction or networking permitted without license from IHS -,-,- ISO 17560:2002(E) ISO 2002 All rights reserved v Introduction This International Standard was prepared for the quantitative depth profiling of boron in silicon by secondary-ion mass spectrometry (SIMS). For quantitative
17、depth profiling, calibration is necessary both for the concentration and the depth scales of the profile measured. A procedure for the determination of boron in silicon has been established as an International Standard, ISO 14237. Thus, the calibration of boron atomic concentration is performed by f
18、ollowing ISO 14237. In this International Standard, standard procedures are described for depth profiling of boron in single-crystal, poly-crystal or amorphous silicon using SIMS and for depth scale calibration using stylus profilometry or optical interferometry. Copyright International Organization
19、 for Standardization Provided by IHS under license with ISO Licensee=NASA Technical Standards 1/9972545001 Not for Resale, 04/20/2007 04:30:50 MDTNo reproduction or networking permitted without license from IHS -,-,- Copyright International Organization for Standardization Provided by IHS under lice
20、nse with ISO Licensee=NASA Technical Standards 1/9972545001 Not for Resale, 04/20/2007 04:30:50 MDTNo reproduction or networking permitted without license from IHS -,-,- INTERNATIONAL STANDARDISO 17560:2002(E) ISO 2002 All rights reserved 1 Surface chemical analysis Secondary-ion mass spectrometry M
21、ethod for depth profiling of boron in silicon 1Scope This International Standard specifies a secondary-ion mass spectrometric method using magnetic-sector or quadrupole mass spectrometers for depth profiling of boron in silicon, and using stylus profilometry or optical interferometry for depth scale
22、 calibration. This method is applicable to single-crystal, poly-crystal or amorphous- silicon specimens with boron atomic concentrations between and , and to crater depths of or deeper. 2Normative reference The following normative document contains provisions which, through reference in this text, c
23、onstitute provisions of this International Standard. For dated references, subsequent amendments to, or revisions of, this publication do not apply. However, parties to agreements based on this International Standard are encouraged to investigate the possibility of applying the most recent edition o
24、f the normative document indicated below. For undated references, the latest edition of the normative document referred to applies. Members of ISO and IEC maintain registers of currently valid International Standards. ISO 14237:2000, Surface chemical analysis Secondary-ion mass spectrometry Determin
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